Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coating, decorative coat, semiconductor components and for processing of silicon components. This is because it’s one of the key materials used to make integrated circuits.
High Purity Titanium Suttering Target for Metal Alloy:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911
Properties:
Titanium sputtering targets are made from titanium metal. This is a strong and lightweight material that is well-respected for its high strength to weight ratio. Titanium metal, a heavy metal that has low density is very ductile in oxygen-free conditions. This makes it shiny and metallic-white. Because it has a high melting temperature (equal to more than 1,650°C/3,000°F), this metal is useful for refractory purposes. Paramagnetic with low thermal conductivity and electrical power,
Application:
This is mainly for flat panel application, DRAMS, and integrated circuits.
Payments & Transport:
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Additional Names |
The Titanium sputtering goal |
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N/A |
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Compound Formula |
Ti |
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Molecular Weight |
N/A |
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Appearance |
N/A |
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Melting Point |
N/A |
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Solubility In Water |
N/A |
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Density |
N/A |
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Purity |
99.6% |
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Size |
Individualized |
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Boling point |
N/A |
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Specific Heat |
N/A |
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Thermo Conductivity |
N/A |
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Thermal Expansion |
N/A |
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Young’s Module |
N/A |
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Exact |
N/A |
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Monoisotopic |
N/A |
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Safety Notice |
N/A |
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Hazard Statements |
N/A |
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Flashing Point |
N/A |
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Hazard Codes |
N/A |
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Risk Codes |
N/A |
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Safety statements |
N/A |
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RTECS # |
N/A |
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Transport Information |
N/A |
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WGK Germany |
N/A |
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